The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 10, 2013

Filed:

Sep. 05, 2012
Applicants:

Satoshi Ishii, Hitachi, JP;

Masahiko Ogino, Hitachi, JP;

Noritake Shizawa, Ninomiya, JP;

Kyoichi Mori, Oiso, JP;

Akihiro Miyauchi, Hitachi, JP;

Inventors:

Satoshi Ishii, Hitachi, JP;

Masahiko Ogino, Hitachi, JP;

Noritake Shizawa, Ninomiya, JP;

Kyoichi Mori, Oiso, JP;

Akihiro Miyauchi, Hitachi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 35/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An object of the present invention is to provide a stamper for transferring fine pattern and a method for manufacturing the stamper, the stamper has a fine structure layer to improve a continuous transferring property of the resinous stamper, and to allow accurate and continuous transferring. In order to achieve the above object, the present invention provides a stamper for transferring fine pattern, including: a fine structure layer on a supporting substrate, in which the fine structure layer is a polymer of a resinous compound whose principal component is silsesquioxane derivative having a plurality of polymerizable functional groups.


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