The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 2013
Filed:
Sep. 10, 2010
Takeshi Kaneko, 's Hertogenbosch, NL;
Erik Henricus Egidius Catharina Eummelen, Eindhoven, NL;
Nina Vladimirovna Dziomkina, Eindhoven, NL;
Matthias Kruizinga, Herten, NL;
Takeshi Kaneko, 's Hertogenbosch, NL;
Erik Henricus Egidius Catharina Eummelen, Eindhoven, NL;
Nina Vladimirovna Dziomkina, Eindhoven, NL;
Matthias Kruizinga, Herten, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An immersion lithographic apparatus that includes a substrate table, a fluid handling structure and a swap table. The substrate table is configured to support a substrate. The fluid handling structure is configured to supply and confine immersion liquid to a space defined between a projection system and the substrate table, the substrate, or both. The swap table has a shutter surface configured to be under the fluid handling structure during, for example, swap of the substrate on the substrate table. In use, a transfer surface between a surface of the substrate table and a surface of the swap table is moved under the fluid handling structure to help stop escaping immersion liquid. A shutter member and a method are also disclosed.