The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 2013
Filed:
Jul. 13, 2012
Paul Frihauf, La Jolla, CA (US);
Daniel J. Riggs, San Diego, CA (US);
Matthew R. Graham, San Diego, CA (US);
Steven Chang, San Diego, CA (US);
Wayne J. Dunstan, San Diego, CA (US);
Paul Frihauf, La Jolla, CA (US);
Daniel J. Riggs, San Diego, CA (US);
Matthew R. Graham, San Diego, CA (US);
Steven Chang, San Diego, CA (US);
Wayne J. Dunstan, San Diego, CA (US);
Cymer, Inc., San Diego, CA (US);
Abstract
Energy output from a laser-produced plasma (LPP) extreme ultraviolet light (EUV) system varies based on how well the laser beam can maintain focus on a target material to generate the plasma that gives off light. The system and method described herein optimize EUV light generation by using a closed-loop gradient process to track and fine-tune in real-time the positioning of optical elements that determine how the laser beam is focused on the target material. When real-time alignment of the drive laser on droplet position is achieved, EUV generation is optimized.