The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 2013
Filed:
Dec. 29, 2010
Applicants:
Daisuke Domon, Joetsu, JP;
Keiichi Masunaga, Joetsu, JP;
Akinobu Tanaka, Joetsu, JP;
Satoshi Watanabe, Joetsu, JP;
Inventors:
Daisuke Domon, Joetsu, JP;
Keiichi Masunaga, Joetsu, JP;
Akinobu Tanaka, Joetsu, JP;
Satoshi Watanabe, Joetsu, JP;
Assignee:
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/26 (2006.01);
U.S. Cl.
CPC ...
Abstract
A negative resist composition comprises a base polymer comprising recurring units having an alkylthio group and having a Mw of 1000-2500, an acid generator, and a basic component, typically an amine compound containing a carboxyl group, but not active hydrogen. A 45-nm line-and-space pattern with a low value of LER can be formed.