The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 2013
Filed:
May. 20, 2011
Chen-hua Tsai, Hsinchu County, TW;
Jian-cheng Chen, New Taipei, TW;
Chin-yueh Tsai, Taichung, TW;
Yao-jen Fan, Chiayi, TW;
Heng-kun Chen, Tainan, TW;
Hsiang Yang, Hsinchu County, TW;
Chen-Hua Tsai, Hsinchu County, TW;
Jian-Cheng Chen, New Taipei, TW;
Chin-Yueh Tsai, Taichung, TW;
Yao-Jen Fan, Chiayi, TW;
Heng-Kun Chen, Tainan, TW;
Hsiang Yang, Hsinchu County, TW;
United Microelectronics Corp., Science-Based Industrial Park, Hsin-Chu, TW;
Abstract
A method for generating dummy patterns includes providing a layout region having a layout pattern with a first density, inserting a plurality of first dummy patterns with a second density corresponding to the first density in the layout pattern, dividing the layout region into a plurality of sub-regions with a third density, adjusting a size of the first dummy pattern according to a difference between the second density and the third density, and outputting the layout pattern and the first dummy patterns on a photomask.