The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 2013
Filed:
Mar. 31, 2010
Jacob Simon Faber, Eindhoven, NL;
Johannes Jacobus Lambertus Mulders, Eindhoven, NL;
Alan Frank DE Jong, Eindhoven, NL;
Carmen Francisca Maria Van Vilsteren, Eindhoven, NL;
Jacob Simon Faber, Eindhoven, NL;
Johannes Jacobus Lambertus Mulders, Eindhoven, NL;
Alan Frank de Jong, Eindhoven, NL;
Carmen Francisca Maria van Vilsteren, Eindhoven, NL;
FEI Company, Hillsboro, OR (US);
Abstract
A method for forming microscopic 3D structures. In the method according to the invention a substrate () is placed in a Scanning Electron Microscope (SEM). The SEM is equipped with a Gas Injection System (GIS) () for directing a jet of precursor fluid to the substrate. The substrate is cooled below the freezing point of the precursor gas so that a frozen layer of the precursor gas can be applied to the substrate. By now repeatedly applying a frozen layer of the precursor to the substrate and irradiate the frozen layer with an electron beam (), a stack of frozen layers () is built, each layer showing an irradiated part () in which the precursor is converted to another material. After applying the last layer the temperature is raised so that the unprocessed precursor () can evaporate. As a result 3D structures with overhanging features can be built.