The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2013
Filed:
Feb. 09, 2012
Arie Jeffrey Den Boef, Waalre, NL;
Marcel Hendrikus Maria Beems, Veldhoven, NL;
Theodorus Petrus Maria Cadee, Vlierden, NL;
Raymond Wilhelmus Louis Lafarre, Helmond, NL;
Arie Jeffrey Den Boef, Waalre, NL;
Marcel Hendrikus Maria Beems, Veldhoven, NL;
Theodorus Petrus Maria Cadee, Vlierden, NL;
Raymond Wilhelmus Louis Lafarre, Helmond, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An apparatus (AS) measures positions of marks () on a lithographic substrate (W). A measurement optical system comprises illumination subsystem () for illuminating the mark with a spot of radiation () and as detecting subsystem () for detecting radiation diffracted by the mark. The substrate and measurement optical system move relative to one another at a first velocity (v) so as to scan the mark while synchronously moving the spot of radiation relative to the reference frame (RF) of the measurement optical system at a second velocity (v). The spot scans the mark at a third velocity (v) which is lower than the first velocity to allow more time for accurate position measurements to be acquired. In one embodiment, an objective lens () remains fixed in relation to the reference frame while a moving optical element () imparts the movement of the radiation spot relative to the reference frame.