The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2013
Filed:
Sep. 07, 2012
Urs T Duerig, Zurich, CH;
Felix Holzner, Zurich, CH;
Cyrill Kuemin, Freienbach, CH;
Armin W. Knoll, Adliswil, CH;
Philip Paul, Zurich, CH;
Heiko Wolf, Pfaeffikon, CH;
Urs T Duerig, Zurich, CH;
Felix Holzner, Zurich, CH;
Cyrill Kuemin, Freienbach, CH;
Armin W. Knoll, Adliswil, CH;
Philip Paul, Zurich, CH;
Heiko Wolf, Pfaeffikon, CH;
International Business Machines Corporation, Armonk, NY (US);
Abstract
The invention notably concerns a method for depositing nano-objects on a surface. The method includes: providing a substrate with surface patterns on one face thereof; providing a transfer layer on said face of the substrate; functionalizing areas on a surface of the transfer layer parallel to said face of the substrate, at locations defined with respect to said surface patterns, such as to exhibit enhanced binding interactions with nano-objects; depositing nano-objects and letting them get captured at the functionalized areas; and thinning down the transfer layer by energetic stimulation to decompose the polymer into evaporating units, until the nano-objects reach the surface of the substrate. The invention also provides a semiconductor device which includes a substrate and nano-objects accurately disposed on the substrate.