The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2013
Filed:
Dec. 15, 2009
Kazunori Mori, Iruma-gun, JP;
Yuji Hagiwara, Kawagoe, JP;
Yoshimi Isono, Kawagoe, JP;
Satoru Narizuka, Saitama, JP;
Kazuhiko Maeda, Chiyoda-ku, JP;
Kazunori Mori, Iruma-gun, JP;
Yuji Hagiwara, Kawagoe, JP;
Yoshimi Isono, Kawagoe, JP;
Satoru Narizuka, Saitama, JP;
Kazuhiko Maeda, Chiyoda-ku, JP;
Central Glass Company, Limited, Ube-shi, JP;
Abstract
There is disclosed a fluorine-containing polymer compound comprising a repeating unit (a) of the following general formula (2) and having a weight-average molecular weight of 1000 to 1000000 where Rrepresents a polymerizable double bond-containing group; Rrepresents a fluorine atom or a fluorine-containing alkyl group; Rrepresents a hydrogen atom, an acid labile group, a cross-linking site or the other monovalent organic group; and Wrepresents a linking moiety. When the fluorine-containing polymer compound is used in a resist compound for pattern formation by high energy radiation of 300 nm or less wavelength or electron beam radiation, it is possible to form a resist pattern with a good rectangular profile.