The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2013
Filed:
Jul. 03, 2003
Takeshi Masuda, Shizuoka-ken, JP;
Masahiko Kajinuma, Shizuoka-ken, JP;
Takakazu Yamada, Shizuoka-ken, JP;
Hiroto Uchida, Kanagawa-ken, JP;
Masaki Uematsu, Shizuoka-ken, JP;
Koukou Suu, Chiba-ken, JP;
Takeshi Masuda, Shizuoka-ken, JP;
Masahiko Kajinuma, Shizuoka-ken, JP;
Takakazu Yamada, Shizuoka-ken, JP;
Hiroto Uchida, Kanagawa-ken, JP;
Masaki Uematsu, Shizuoka-ken, JP;
Koukou Suu, Chiba-ken, JP;
Ulvac, Inc., Kanagawa, JP;
Abstract
A thin film-forming apparatus, for ensuring uniform plane distribution of properties of a film formed on a substrate surface, has a gas-supply portsupplying a gas mixture from a gas-mixing chamberto a shower head. The port is arranged at the peripheral portion on the bottom face of the gas-mixing chamber so that the gas mixture flows from the upper peripheral region of the head towards the center thereof. An exhaust portdischarging the exhaust gas generated in the film-forming chamberis arranged at a position lower than the level of a stageduring film-formation directing the exhaust gas towards the side wall of the chamberand discharging the exhaust gas through the exhaust port. The stageis designed to move freely up and down to adjust the distance between the shower headand substrate S.