The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 19, 2013
Filed:
Oct. 29, 2010
John J. Biafore, North Scituate, RI (US);
Mark D. Smith, Austin, TX (US);
John S. Graves, Iii, Austin, TX (US);
David Blankenship, Austin, TX (US);
John J. Biafore, North Scituate, RI (US);
Mark D. Smith, Austin, TX (US);
John S. Graves, III, Austin, TX (US);
David Blankenship, Austin, TX (US);
KLA-Tencor Corporation, Milpitas, CA (US);
Abstract
A processor based method for measuring dimensional properties of a photoresist profile. A number acid generators and quenchers within a photoresist volume is determined. A number of photons absorbed by the photoresist volume is determined. A number of the acid generators converted to acid is determined. A number of acid and quencher reactions within the photoresist volume is determined. A development of the photoresist volume is calculated. The processor is used to produce a three-dimensional simulated scanning electron microscope image of the photoresist profile created by the development of the photoresist volume. The dimensional properties of the photoresist profile are measured.