The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 19, 2013

Filed:

Dec. 21, 2011
Applicants:

David William Sesko, Woodinville, WA (US);

Michael Nahum, Kirkland, WA (US);

Inventors:

David William Sesko, Woodinville, WA (US);

Michael Nahum, Kirkland, WA (US);

Assignee:

Mitutoyo Corporation, Kawasaki-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01C 3/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

A chromatic point sensor system configured to compensate for potential errors due to workpiece material effects comprises a first confocal optical path including a longitudinally dispersive element configured to focus different wavelengths at different distances proximate to a workpiece; a second optical path configured to focus different wavelengths at substantially the same distance proximate to the workpiece; a light source connected to the first confocal optical path; a light source connected to the second optical path; a first confocal optical path disabling element; a second optical path disabling element; and a CPS electronics comprising a CPS wavelength detector which provides output spectral profile data. The output spectral profile data from the second optical path is usable to compensate output spectral profile data from the first confocal optical path for a distance-independent profile component that includes errors due to workpiece material effects.


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