The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 19, 2013

Filed:

Sep. 25, 2008
Applicants:

Bob Streefkerk, Tilburg, NL;

Roelof Frederik DE Graaf, Veldhoven, NL;

Johannes Catharinus Hubertus Mulkens, Waalre, NL;

Marcel Beckers, Eindhoven, NL;

Paul Petrus Joannes Berkvens, Veldhoven, NL;

David Lucien Anstotz, Westhoffen, FR;

Inventors:

Bob Streefkerk, Tilburg, NL;

Roelof Frederik De Graaf, Veldhoven, NL;

Johannes Catharinus Hubertus Mulkens, Waalre, NL;

Marcel Beckers, Eindhoven, NL;

Paul Petrus Joannes Berkvens, Veldhoven, NL;

David Lucien Anstotz, Westhoffen, FR;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/52 (2006.01); G03B 27/42 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of operating a fluid confinement system of an immersion lithographic apparatus is disclosed. The performance of the liquid confinement system is measured in several different ways. On the basis of the result of the measurement of performance, a signal indicating, for example, that a remedial action may need to be taken is generated.


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