The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2013
Filed:
Jul. 10, 2012
Applicants:
Masafumi Watanabe, Chiba, JP;
Hiroumi Momota, Chiba, JP;
Inventors:
Masafumi Watanabe, Chiba, JP;
Hiroumi Momota, Chiba, JP;
Assignee:
SII Nanotechnology Inc., Chiba, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01Q 70/16 (2010.01); G01Q 70/08 (2010.01); G01Q 60/22 (2010.01); G01Q 70/10 (2010.01); G01Q 60/38 (2010.01);
U.S. Cl.
CPC ...
G01Q 60/22 (2013.01); G01Q 70/10 (2013.01); G01Q 60/38 (2013.01);
Abstract
In a cantilever which is used in a scanning probe microscope or the like and has a trapezoidal cross-sectional shape formed through anisotropic etching in a silicon process, a cantilever spring constant is determined without measuring a thickness directly. A cantilever thickness is determined based on upper base and lower base lengths of the trapezoidal cross-sectional shape and geometric regularity of a surface generated by the anisotropic etching. Then, the cantilever spring constant is determined based on the cantilever thickness, a cantilever length, and a Young's modulus.