The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2013
Filed:
Feb. 01, 2012
Tomoyuki Watanabe, Kudamatsu, JP;
Mamoru Yakushiji, Shunan, JP;
Michikazu Morimoto, Kudamatsu, JP;
Tetsuo Ono, Kudamatsu, JP;
Tomoyuki Watanabe, Kudamatsu, JP;
Mamoru Yakushiji, Shunan, JP;
Michikazu Morimoto, Kudamatsu, JP;
Tetsuo Ono, Kudamatsu, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
It is an object of the present invention to provide a plasma etching method that can improve a selection ratio of a film to be etched to a film different from the film to be etched than that in the related art. The present invention provides a plasma etching method for selectively etching a film to be etched with respect to another film different from the film to be etched, the plasma etching method including etching, using gas that can generate a deposited film containing components same as components of the another film different from the film to be etched, the film on which generation of the deposited film is suppressed.