The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2013
Filed:
Dec. 15, 2009
Kosuke Ogasawara, Nirasaki, JP;
Susumu Saito, Nirasaki, JP;
Syuji Nozawa, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A plasma processing apparatus for generating a plasma of a processing gas by applying a high frequency power to an electrode provided in a processing chamber and processing a substrate using the plasma is provided. The plasma processing apparatus includes an optical data detection unit, a data storage unit and a control unit. The optical data detection unit detects optical data when plasma processing the substrate. The data storage unit stores correlation data representing a correlation between type data corresponding to a plurality of types classified based on a type of a mask or a film to be processed disposed on the substrate and optical data to be detected by the optical data detection unit, and end point detection setting data sets, each of the setting data sets serving to detect a plasma processing end point and corresponding to one of the types.