The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2013
Filed:
May. 22, 2003
Alan Frederick Becknell, Ellicott City, MD (US);
Thomas James Buckley, Ijamsville, MD (US);
David Ferris, Rockville, MD (US);
Richard E. Pingree, Jr., New Market, MD (US);
Palanikumaran Sakthivel, Gaithersburg, MD (US);
Aseem Kumar Srivastava, Germantown, MD (US);
Carlo Waldfried, Falls Church, VA (US);
Alan Frederick Becknell, Ellicott City, MD (US);
Thomas James Buckley, Ijamsville, MD (US);
David Ferris, Rockville, MD (US);
Richard E. Pingree, Jr., New Market, MD (US);
Palanikumaran Sakthivel, Gaithersburg, MD (US);
Aseem Kumar Srivastava, Germantown, MD (US);
Carlo Waldfried, Falls Church, VA (US);
LAM Research Corporation, Fremont, CA (US);
Abstract
A plasma apparatus, various components of the plasma apparatus, and an oxygen free and nitrogen free processes for effectively removing photoresist material and post etch residues from a substrate with a carbon and/or hydrogen containing low k dielectric layer(s).