The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2013
Filed:
Jul. 13, 2011
Motonori Sato, Kanagawa-ken, JP;
Poong Kim, Kanagawa-ken, JP;
Manabu Ito, Kanagawa-ken, JP;
Tadashi Masuda, Kanagawa-ken, JP;
Motonori Sato, Kanagawa-ken, JP;
Poong Kim, Kanagawa-ken, JP;
Manabu Ito, Kanagawa-ken, JP;
Tadashi Masuda, Kanagawa-ken, JP;
Ulvac, Inc., Kanagawa, JP;
Abstract
A method for producing a Ta sputtering target including the following steps: (a) a step of forging a Ta ingot, comprising subjecting the Ta ingot to a forging pattern over at least 3 times, wherein each forging pattern is 'a cold forging step comprising stamp-forging and upset-forging operations alternatively repeated over at least 3 times; (b) an in-process vacuum heat-treating step carried out between every successive two forging patterns to thus prepare a Ta billet; (c) a step of rolling the Ta billet to obtain a rolled plate; and (d) a step of vacuum heat-treating the rolled plate to obtain a Ta sputtering target. A sputtering target produced by the above method.