The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 05, 2013

Filed:

Feb. 27, 2006
Applicants:

Gary Y. M. Kang, Fremont, CA (US);

Ryne M. H. Shen, Tainan, TW;

Fei Wang, Fremont, CA (US);

Yi-shung Chaug, Cupertino, CA (US);

Inventors:

Gary Y. M. Kang, Fremont, CA (US);

Ryne M. H. Shen, Tainan, TW;

Fei Wang, Fremont, CA (US);

Yi-Shung Chaug, Cupertino, CA (US);

Assignee:

Sipix Imaging, Inc., Fremont, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G09G 3/34 (2006.01); H05K 1/00 (2006.01); C09K 19/52 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention relates to design and processes for the manufacture of backplane for segment displays. The process comprises: a) forming conductive lines on a non-conductive substrate layer; b) covering the conductive lines with a photoimageable material; c) forming conductive areas connected to the conductive lines and embedded in the photoimageable material; d) plating a conductive material over the photoimageable material to form segment electrodes; and e) optionally filling gaps between said segment electrodes with a thermal or radiation curable material followed by hardening said thermal or radiation curable material.


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