The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 29, 2013
Filed:
Aug. 10, 2011
Lithographic apparatus, device manufacturing method, and method of applying a pattern to a substrate
Laurent Khuat Duy, Eindhoven, NL;
Noud Jan Gilissen, 's-Gravenzande, NL;
Laurent Khuat Duy, Eindhoven, NL;
Noud Jan Gilissen, 's-Gravenzande, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus is arranged to transfer a pattern from a patterning device onto a substrate, in which a measuring subsystem includes one or (preferably) more alignment & level sensors (AS, LS) directed at the substrate near a patterning location of a patterning subsystem. The alignment sensor(s) is operable to recognize and measure alignment marks (P) on the substrate passing by the sensor during relative motion of the substrate and patterning subsystem under control of the positioning subsystem. A processor combines measurements of relative locations of a plurality of said marks to provide measurement results with an accuracy sufficient for the positioning subsystem to position at least a first substrate portion at said patterning location relative to said alignment marks. A preliminary step obtains position relative to a known pattern (M) on the patterning device. Measurements are taken and updated in real time during exposure of successive substrate portions.