The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 29, 2013

Filed:

Feb. 02, 2012
Applicants:

Kota Funayama, Kanagawa, JP;

Hiraku Chakihara, Kanagawa, JP;

Inventors:

Kota Funayama, Kanagawa, JP;

Hiraku Chakihara, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/76 (2006.01); G03C 5/18 (2006.01);
U.S. Cl.
CPC ...
Abstract

In the present invention, in the exposure to light of a memory cell array or the like of a semiconductor memory or the like, when a group of unit openings for etching the STI trench regions in which the unit openings for etching the STI trench regions each having a rectangular shape are arranged in rows and columns are transferred by the exposure onto a negative resist film, multiple exposure is appropriately used which includes a first exposure step using a first optical mask having a group of first linear openings extending in a column direction and a second exposure step using a second optical mask having a group of second linear openings extending in a row direction.


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