The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 2013
Filed:
Nov. 21, 2008
Kent Y. Kwang, Saratoga, CA (US);
Daniel Zhang, Milpitas, CA (US);
Zongwu Tang, Pleasanton, CA (US);
Subarnarekha Sinha, Menlo Park, CA (US);
Kent Y. Kwang, Saratoga, CA (US);
Daniel Zhang, Milpitas, CA (US);
Zongwu Tang, Pleasanton, CA (US);
Subarnarekha Sinha, Menlo Park, CA (US);
Synopsys, Inc., Mountain View, CA (US);
Abstract
One embodiment of the present invention provides a system that automatically processes manufacturing hotspot information. During operation, the system receives a pattern clip associated with a manufacturing hotspot in a layout, wherein the pattern clip comprises a set of polygons in proximity to the manufacturing hotspot's location. Next, the system determines if the pattern clip matches a known manufacturing hotspot configuration. If the pattern clip does not match a known manufacturing hotspot configuration, the system then performs a perturbation process on the pattern clip to determine a set of correction recommendations to eliminate the manufacturing hotspot. By performing the perturbation process, the system additionally determines ranges of perturbation to the set of polygons wherein the perturbed pattern clip does not eliminate the manufacturing hotspot. Subsequently, the system stores the set of correction recommendations and the ranges of perturbation into a manufacturing hotspot database.