The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 2013
Filed:
Mar. 04, 2009
Atsushi Shigenobu, Utsunomiya, JP;
Yasuo Hasegawa, Utsunomiya, JP;
Takashi Sukegawa, Utsunomiya, JP;
Atsushi Shigenobu, Utsunomiya, JP;
Yasuo Hasegawa, Utsunomiya, JP;
Takashi Sukegawa, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
The present invention provides an exposure apparatus including a map obtaining unit configured to obtain a pupil aberration map representing saturation values of fluctuations in each of optical characteristics generated in a plurality of regions, which are obtained by dividing a pupil plane of a projection optical system, upon irradiating the plurality of regions with a unit amount of light, a distribution obtaining unit configured to obtain a light intensity distribution formed on the pupil plane of the projection optical system upon illuminating a pattern of an arbitrary reticle in an arbitrary illumination mode, and a calculation unit configured to calculate a saturation value of a fluctuation in each of the optical characteristics generated in the projection optical system upon illuminating the pattern of the arbitrary reticle in the arbitrary illumination mode, based on the obtained pupil aberration map and the obtained light intensity distribution.
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