The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 2013
Filed:
Oct. 14, 2010
Katsuhiro Kikuchi, Osaka, JP;
Kentaro Usui, Osaka, JP;
Masakazu Shibasaki, Osaka, JP;
Takashi Ochi, Osaka, JP;
Tatsuro Kato, Osaka, JP;
Kenichi Hamada, Tokyo, JP;
Masashi Arai, Tokyo, JP;
Megumi Murata, Tokyo, JP;
Hideaki Takase, Tokyo, JP;
Katsuhiro Kikuchi, Osaka, JP;
Kentaro Usui, Osaka, JP;
Masakazu Shibasaki, Osaka, JP;
Takashi Ochi, Osaka, JP;
Tatsuro Kato, Osaka, JP;
Kenichi Hamada, Tokyo, JP;
Masashi Arai, Tokyo, JP;
Megumi Murata, Tokyo, JP;
Hideaki Takase, Tokyo, JP;
Sharp Corporation, Osaka-shi, JP;
JSR Corporation, Tokyo, JP;
Abstract
The present invention relates to a radiation sensitive resin composition comprising [A] an alkali-soluble resin, [B] a 1,2-quinonediazide compound and [C] a radical trapping agent. The radiation sensitive resin composition can provide an interlayer insulating film which satisfies general requirements for an interlayer insulating film such as high light transmittance and has excellent heat-resistant dimensional stability, heat discoloration resistance and adhesion to a substrate along with the improvement of process efficiency for improving product yield at a high resolution and has excellent storage stability.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile