The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 2013
Filed:
Apr. 22, 2010
Satoshi Ishii, Hitachi, JP;
Masahiko Ogino, Hitachi, JP;
Noritake Shizawa, Ninomiya, JP;
Kyoichi Mori, Oiso, JP;
Akihiro Miyauchi, Hitachi, JP;
Satoshi Ishii, Hitachi, JP;
Masahiko Ogino, Hitachi, JP;
Noritake Shizawa, Ninomiya, JP;
Kyoichi Mori, Oiso, JP;
Akihiro Miyauchi, Hitachi, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
An object of the present invention is to provide a micropattern transfer method and a micropattern transfer device in which the small amount of resin is applied to a substrate, and the nonuniformity in thickness is prevented to arise on the obtained pattern forming layer. In order to achieve the above object, the present invention provides a micropattern transfer method in which a micropattern is transferred to a resin by pressing a stamper having the micropattern onto the resin applied to a substrate, including the steps of: applying the resin to a surface of the substrate discretely in order to obtain a plurality of resin islands so that a center portion of each of the resin islands forms a planar thin-film, and a peripheral portion of the resin island rises higher than the center portion.