The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2013
Filed:
Dec. 19, 2008
Applicants:
Borgert Kruizinga, Zoetermeer, NL;
Martijn Gerard Dominique Wehrens, Waalre, NL;
Michiel David Nijkerk, Amsterdam, NL;
Kornelis Frits Feenstra, Cuijk, NL;
Inventors:
Borgert Kruizinga, Zoetermeer, NL;
Martijn Gerard Dominique Wehrens, Waalre, NL;
Michiel David Nijkerk, Amsterdam, NL;
Kornelis Frits Feenstra, Cuijk, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 5/18 (2006.01); G06K 7/10 (2006.01);
U.S. Cl.
CPC ...
Abstract
A grating for EUV-radiation includes a plurality of reflecting lines. Each reflecting line includes a plurality of first reflecting dots, and a plurality of second reflecting dots arranged between each other. The first reflecting dots and the second reflecting dots are configured to reflect EUV-radiation with a mutual phase difference of 180±10 degrees mod 360 degrees.