The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2013
Filed:
Mar. 21, 2012
Wu-song Huang, Brewster, NY (US);
Libor Vyklicky, Yorktown Heights, NY (US);
Pushkara Rao Varanasi, Poughkeepsie, NY (US);
Wu-Song Huang, Brewster, NY (US);
Libor Vyklicky, Yorktown Heights, NY (US);
Pushkara Rao Varanasi, Poughkeepsie, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Compositions characterized by the presence of an aqueous base-soluble polymer having aromatic moieties and aliphatic alcohol moieties have been found which are especially useful as developable bottom antireflective coatings in 193 nm lithographic processes. The compositions enable improved lithographic processes which are especially useful in the context of subsequent ion implantation or other similar processes where avoidance of aggressive antireflective coating removal techniques is desired.