The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2013
Filed:
Jun. 09, 2009
Thomas Drescher, Gifhorn, DE;
Bernd Hangleiter, Gifhorn, DE;
Joachim Schuetz, Hillerse, DE;
Annegret Matthai, Baar-Ebenhausen, DE;
Heike Walter, Braunschweig, DE;
Felix Horstmann, Braunschweig, DE;
Bernd Szyszka, Braunschweig, DE;
Volker Sittinger, Braunschweig, DE;
Wolfgang Werner, Braunschweig, DE;
Tjhay Weyna Boentoro, Braunschweig, DE;
Thomas Drescher, Gifhorn, DE;
Bernd Hangleiter, Gifhorn, DE;
Joachim Schuetz, Hillerse, DE;
Annegret Matthai, Baar-Ebenhausen, DE;
Heike Walter, Braunschweig, DE;
Felix Horstmann, Braunschweig, DE;
Bernd Szyszka, Braunschweig, DE;
Volker Sittinger, Braunschweig, DE;
Wolfgang Werner, Braunschweig, DE;
Tjhay Weyna Boentoro, Braunschweig, DE;
Audi AG, Ingolstadt, DE;
Abstract
The present invention relates to a glass product, comprising a glass substrate with a transparent and conductive indium tin oxide layer having a covering layer, which forms a redox barrier for the indium tin oxide layer, wherein the indium tin oxide layer is obtained by pulsed, highly ionizing high-power magnetron sputtering (HPPMS) in which—the pulses of the magnetron have a peak power density greater than 1.5 kW/cm,—the pulses of the magnetron have a time duration that is ≦200 μs, and—the mean current flow density rise upon ignition of the plasma within a time interval that is ≦0.025 ms is at least 106 Λ(ms cm2), and the indium tin oxide layer has a crystalline structure, in such a way that the (222)-reflection of an X-ray diffraction spectrum after the production of the indium tin oxide layer is shifted relative to the powder spectrum of indium tin oxide by a maximum of 1 degree, preferably by 0.3 degrees to 0.5 degrees, in the direction of compressive stress and is shifted after heat treatment by a maximum of 1 degree, preferably by 0.2 degrees to 0.4 degrees, in the direction of the powder spectrum.