The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 08, 2013
Filed:
Mar. 23, 2006
Applicants:
Shoutian LI, Naperville, IL (US);
Phillip W. Carter, Naperville, IL (US);
Jian Zhang, Aurora, IL (US);
Inventors:
Shoutian Li, Naperville, IL (US);
Phillip W. Carter, Naperville, IL (US);
Jian Zhang, Aurora, IL (US);
Assignee:
Cabot Microelectronics Corporation, Aurora, IL (US);
Primary Examiner:
Int. Cl.
CPC ...
C09G 1/02 (2006.01); C09G 1/04 (2006.01);
U.S. Cl.
CPC ...
Abstract
The invention provides compositions and methods for planarizing or polishing a substrate. The composition comprises an abrasive, iodate ion, a nitrogen-containing compound selected from the group consisting of a nitrogen-containing Cheterocycle and a Calkylamine, and a liquid carrier comprising water.
Li, Shoutian. (2013). Iodate-containing chemical-mechanical polishing compositions and methods (U.S. Patent No. 8551202). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8551202
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile