The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 01, 2013
Filed:
Apr. 07, 2009
William A. Stanton, Beaverton, OR (US);
Gurtej S. Sandhu, Boise, ID (US);
William A. Stanton, Beaverton, OR (US);
Gurtej S. Sandhu, Boise, ID (US);
Micron Technology, Inc., Boise, ID (US);
Abstract
Several embodiments of photolithography systems and associated methods of selective die exposure are disclosed herein. In one embodiment, a method for exposing a microelectronic substrate in a photolithography system includes producing an illumination radiation from a radiation source and identifying a field on the microelectronic substrate to be exposed. The field is partitioned into a first region discrete from a second region. The method further includes inhibiting the illumination radiation to expose the first region while simultaneously exposing the second region to the illumination radiation.