The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 01, 2013
Filed:
Sep. 07, 2011
Ji-young Shin, Seoul, KR;
Young-nam Kim, Suwon-si, KR;
Jong-an Kim, Seoul, KR;
Hyung-suk Cho, Hwaseong-si, KR;
Yu-sin Yang, Seoul, KR;
Ji-Young Shin, Seoul, KR;
Young-Nam Kim, Suwon-si, KR;
Jong-An Kim, Seoul, KR;
Hyung-Suk Cho, Hwaseong-si, KR;
Yu-Sin Yang, Seoul, KR;
Samsung Electronics Co., Ltd, Suwon-si, KR;
Abstract
An apparatus and method to inspect a defect of a substrate. Since a recess of an under layer of a substrate is darker than a projection of a top layer, a ratio of a value of a secondary electron signal (of an SEM) of the under layer to a value of the top layer may be increased to improve a pattern image used to inspect an under layer defect. Several conditions under which electron beams are irradiated may be set, and the pattern may be scanned under such conditions. Secondary electron signals may be generated according to the conditions and converted into image data to display various pattern images. Scan information on the images may be stored with positional information on the substrate. Each of scan information on the pattern images may be calculated to generate a new integrated image.