The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 01, 2013
Filed:
Jul. 22, 2008
Applicants:
Sebastien Donet, Meaudre, FR;
Fabrice Emieux, Voreppe, FR;
Lionel Filhol, Saint Sauveur, FR;
Stephanie Thollon, Salles, FR;
Inventors:
Sebastien Donet, Meaudre, FR;
Fabrice Emieux, Voreppe, FR;
Lionel Filhol, Saint Sauveur, FR;
Stephanie Thollon, Salles, FR;
Assignee:
Commissariat a l'Energie Atomique, Paris, FR;
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/06 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method and a device for infiltration of a structure made of a porous material by chemical vapor deposition. According to the method, a first face of the porous material structure is exposed to a gaseous flow, and the second face is maintained at least partially free from any contact.
Donet, Sebastien. (2013). Method and device for the infiltration of a structure of a porous material by chemical vapour deposition (U.S. Patent No. 8545939). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8545939
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile