The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 01, 2013
Filed:
Jan. 18, 2010
Yasushi Utsugi, Hitachinaka, JP;
Kuniaki Onizawa, Hitachinaka, JP;
Ken Takakura, Tokai, JP;
Yoshio Kiyonari, Hitachinaka, JP;
Isao Yamazaki, Hitachinaka, JP;
Yasushi Utsugi, Hitachinaka, JP;
Kuniaki Onizawa, Hitachinaka, JP;
Ken Takakura, Tokai, JP;
Yoshio Kiyonari, Hitachinaka, JP;
Isao Yamazaki, Hitachinaka, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
A sample treatment apparatus is designed to directly monitor a pressure signal from a pressure sensor to examine pressure fluctuations resulting from a sample's sway before a discharge of the sample, so that the discharge is performed after the confirmation of the absence of pressure changes. The apparatus has a detection function that allows a discharge to be started even before a pressure fluctuation vanishes completely, by allowing the operator to set a desired number of pressure monitorings, monitoring time, or pressure amplitude. The detection function also allows an alarm to be raised when a pressure fluctuation has not fallen within a given range. The sample treatment apparatus therefore allows discharge of more accurate amounts of samples.