The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 01, 2013
Filed:
Feb. 25, 2005
Leonard J. Mahoney, Fort Collins, CO (US);
Carl W. Almgren, Fort Collins, CO (US);
Gregory A. Roche, Fort Collins, CO (US);
William W. Saylor, Windsor, CO (US);
William D. Sproul, Fort Collins, CO (US);
Hendrik V. Walde, Fort Collins, CO (US);
Leonard J. Mahoney, Fort Collins, CO (US);
Carl W. Almgren, Fort Collins, CO (US);
Gregory A. Roche, Fort Collins, CO (US);
William W. Saylor, Windsor, CO (US);
William D. Sproul, Fort Collins, CO (US);
Hendrik V. Walde, Fort Collins, CO (US);
KLA-Tencor Corporation, San Jose, CA (US);
Abstract
A plasma processing system is provided with diagnostic apparatus for making in-situ measurements of plasma properties. The diagnostic apparatus generally comprises a non-invasive sensor array disposed within a plasma processing chamber, an electrical circuit for stimulating the sensors, and means for recording and communicating sensor measurements for monitoring or control of the plasma process. In one form, the sensors are dynamically pulsed dual floating Langmuir probes that measure incident charged particle currents and electron temperatures in proximity to the plasma boundary or boundaries within the processing system. The plasma measurements may be used to monitor the condition of the processing plasma or furnished to a process system controller for use in controlling the plasma process.