The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 24, 2013
Filed:
Dec. 11, 2009
Qiang Chen, Cupertino, CA (US);
Sridhar Tirumala, Saratoga, CA (US);
Qiang Chen, Cupertino, CA (US);
Sridhar Tirumala, Saratoga, CA (US);
Synopsys, Inc., Mountain View, CA (US);
Abstract
An EDA method is implemented for modifying a layout file after place and route. The method includes storing a library of shape modifications for cells in the design library used for implementation of the circuit. The library of shape modifications includes the results of process-specific calibration of the shape modifications which indicate adjustment of a circuit parameter caused by applying the shape modifications to the cells. The layout file is analyzed to identify a cell for adjustment of the circuit parameter. A shape modification calibrated to achieve the desired adjustment is selected from the library. The shape modification is applied to the identified cell in the layout file to produce a modified layout file. The modified layout file can be used for tape out, and subsequently for manufacturing of an improved integrated circuit.