The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 24, 2013
Filed:
Sep. 26, 2008
Arjen Boogaard, Deventer, NL;
Timotheus Franciscus Sengers, 's-Hertogenbosch, NL;
Wilhelmus Sebastianus Marcus Maria Ketelaars, Eindhoven, NL;
Carolus Ida Maria Antonius Spee, Helmond, NL;
Arjen Boogaard, Deventer, NL;
Timotheus Franciscus Sengers, 's-Hertogenbosch, NL;
Wilhelmus Sebastianus Marcus Maria Ketelaars, Eindhoven, NL;
Carolus Ida Maria Antonius Spee, Helmond, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An exposure apparatus includes a radiation system configured to supply a projection beam of radiation, and a patterning device configured to pattern the projection beam according to a desired pattern. The apparatus includes a substrate table having an area configured to support a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate. At least a part of the apparatus that during use of the apparatus is exposed to radiation is coated with a coating. The coating includes a metal oxide, or a photocatalyst, or a semiconductor, or any combination thereof.