The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2013
Filed:
Nov. 30, 2010
Chethan Makam, Irving, TX (US);
Swapneel H. Desai, Dallas, TX (US);
Vittal Gunturu, Flower Mound, TX (US);
Miguel Quiroga, New York, NY (US);
Zouhair Sebati, Edgewater, NJ (US);
Chethan Makam, Irving, TX (US);
Swapneel H. Desai, Dallas, TX (US);
Vittal Gunturu, Flower Mound, TX (US);
Miguel Quiroga, New York, NY (US);
Zouhair Sebati, Edgewater, NJ (US);
Verizon Patent and Licensing Inc., Basking Ridge, NJ (US);
Abstract
An exemplary system includes a workflow integration subsystem communicatively coupled to a backend workflow subsystem maintaining a set of backend workflow tasks native to the backend workflow subsystem, the workflow integration subsystem configured to maintain a set of integrated workflow tasks representative of the set of backend workflow tasks. The system also includes a portal subsystem configured to communicate with the workflow integration subsystem and the backend workflow subsystem. The portal subsystem is further configured to provide a frontend portal for access by a user, receive a request provided by the user through the frontend portal, and provide access to workflow functionality through the frontend portal in response to the request, wherein the portal subsystem is configured to select whether the workflow functionality is subject to control by the backend workflow subsystem or the portal subsystem. Corresponding systems and methods are also disclosed.