The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 17, 2013

Filed:

Nov. 30, 2011
Applicants:

Yimao Cai, Beijing, CN;

Song Mei, Beijing, CN;

RU Huang, Beijing, CN;

Inventors:

Yimao Cai, Beijing, CN;

Song Mei, Beijing, CN;

Ru Huang, Beijing, CN;

Assignee:

Peking University, Beijing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/788 (2006.01); H01L 21/336 (2006.01); H01L 21/3205 (2006.01); H01L 21/4763 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention discloses a floating gate structure of a flash memory device and a method for fabricating the same, which relates to a nonvolatile memory in a manufacturing technology of an ultra-large-scaled integrated circuit. In the invention, by modifying a manufacturing of a floating gate in the a standard process for the flash memory, that is, by adding three steps of deposition, two steps of etching and one step of CMP, an-shaped floating gate is formed. In addition to these steps, all the other steps are the same as those of the standard process for the flash memory process. By the invention, a coupling ratio may be improved effectively and a crosstalk between adjacent devices may be lowered, without adding additional photomasks and barely increasing a process complexity, which are very important to improve programming speed and reliability.


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