The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8536025 B1

PDF
Full Text
Expired
Date of Patent:
Sep. 17, 2013

Filed:

Dec. 12, 2011
Applicants:

Dennis P. Hogan, Jericho, VT (US);

Gregory S. Jankowski, Milton, VT (US);

Robert K. Leidy, Burlington, VT (US);

Inventors:

Dennis P. Hogan, Jericho, VT (US);

Gregory S. Jankowski, Milton, VT (US);

Robert K. Leidy, Burlington, VT (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/46 (2006.01); H01L 21/301 (2006.01);
U.S. Cl.
CPC ...
Abstract

A resized wafer using a negative photoresist ring, methods of manufacture and design structures thereof are disclosed. The method includes forming a ring within a radius of a wafer. The method also includes patterning a photoresist formed on the wafer, by exposing the photoresist to energy. Additionally, the method includes forming troughs in a substrate of the wafer based on the patterning of the photoresist, wherein the ring blocks formation of the troughs underneath the ring. The method also includes filling the troughs with a metal and resizing the wafer at an area of the ring.


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