The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 10, 2013
Filed:
May. 02, 2008
Erik Scher, San Francisco, CA (US);
Steven Molesa, Sunnyvale, CA (US);
Joerg Rockenberger, San Jose, CA (US);
Arvind Kamath, Mountain View, CA (US);
Ikuo Mori, San Jose, CA (US);
Erik Scher, San Francisco, CA (US);
Steven Molesa, Sunnyvale, CA (US);
Joerg Rockenberger, San Jose, CA (US);
Arvind Kamath, Mountain View, CA (US);
Ikuo Mori, San Jose, CA (US);
Kovio, Inc., San Jose, CA (US);
Abstract
Embodiments relate to printing features from an ink containing a material precursor. In some embodiments, the material includes an electrically active material, such as a semiconductor, a metal, or a combination thereof. In another embodiment, the material includes a dielectric. The embodiments provide improved printing process conditions that allow for more precise control of the shape, profile and dimensions of a printed line or other feature. The composition(s) and/or method(s) improve control of pinning by increasing the viscosity and mass loading of components in the ink. An exemplary method thus includes printing an ink comprising a material precursor and a solvent in a pattern on the substrate; precipitating the precursor in the pattern to form a pinning line; substantially evaporating the solvent to form a feature of the material precursor defined by the pinning line; and converting the material precursor to the patterned material.