The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 10, 2013
Filed:
Nov. 12, 2009
Applicants:
Sidlgata V. Sreenivasan, Austin, TX (US);
Shuqiang Yang, Austin, TX (US);
Frank Y. Xu, Round Rock, TX (US);
Dwayne L. Labrake, Cedar Park, TX (US);
Inventors:
Sidlgata V. Sreenivasan, Austin, TX (US);
Shuqiang Yang, Austin, TX (US);
Frank Y. Xu, Round Rock, TX (US);
Dwayne L. LaBrake, Cedar Park, TX (US);
Assignees:
Molecular Imprints, Inc., Austin, TX (US);
Board of Regents, The University of Texas System, Austin, TX (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01);
U.S. Cl.
CPC ...
Abstract
Methods for creating nano-shaped patterns are described. This approach may be used to directly pattern substrates and/or create imprint lithography molds that may be subsequently used to directly replicate nano-shaped patterns into other substrates in a high throughput process.