The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 10, 2013
Filed:
Mar. 27, 2009
Sung-tae Je, Gumi-si, KR;
Il-kwang Yang, Yongin-si, KR;
Chan-yong Park, Icheon-si, KR;
Eugene Technology Co., Ltd., Yongin, KR;
Abstract
Disclosed is a substrate processing apparatus and method. The substrate processing apparatus includes a process chamber () providing an internal space, in which a process is carried out onto a substrate; a support member () installed in the process chamber () to support the substrate; and a shower head () located above the support member () to supply a source gas toward the support member (), wherein the shower head () includes a first injection surface () located at a position separated from the upper surface of the substrate by a first distance, and provided with outlets of first injection holes () to inject the source gas; and a second injection surface () located at a position separated from the upper surface of the substrate by a second distance being different from the first distance, and provided with outlets of second injection holes () to inject the source gas.