The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 03, 2013

Filed:

Apr. 19, 2011
Applicants:

Ji-myoung Lee, Yongin-si, KR;

Min-sang Kim, Seoul, KR;

Dong-won Kim, Seongnam-si, KR;

Inventors:

Ji-myoung Lee, Yongin-si, KR;

Min-sang Kim, Seoul, KR;

Dong-won Kim, Seongnam-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01);
U.S. Cl.
CPC ...
Abstract

A semiconductor device that may control a formation of a channel is disclosed. The semiconductor device includes a gate region including a first area, an insulating layer disposed on portions of a top surface of the gate region corresponding to both ends portions of the first area, first and second electrodes formed on the insulating layer to be spaced apart from each other, an elastic conductive layer disposed between the first and second electrodes and the insulating layer and having a shape that varies according to an electrostatic force based on voltages applied to the first electrode, the second electrode, and the gate region, and a gate insulating region disposed between the elastic conductive layer and the first area of the gate region.


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