The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 03, 2013
Filed:
Jul. 11, 2011
Yi-chih Chiang, Tainan, TW;
Yuan-chi Pai, Tainan, TW;
Sho-shen Lee, New Taipei, TW;
Yi-ting Chen, Kaohsiung, TW;
Tuan-yen Yu, Tainan, TW;
Yi-Chih Chiang, Tainan, TW;
Yuan-Chi Pai, Tainan, TW;
Sho-Shen Lee, New Taipei, TW;
Yi-Ting Chen, Kaohsiung, TW;
Tuan-Yen Yu, Tainan, TW;
United Microelectronics Corp., Science-Based Industrial Park, Hsin-Chu, TW;
Abstract
A method of forming assist feature patterns includes providing an original layout pattern having at least a first region defined therein, the first region having a first light transmission rate larger than 0%; performing a search step to the original layout pattern to define at least a second region having a second light transmission rate equal to 0% in the original layout pattern; forming a plurality of assist features in the second region to increase the second light transmission rate to larger than 0%; and outputting the original layout pattern and the assist features to a reticle blank.