The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 2013
Filed:
Jul. 10, 2009
Willem Marie Julia Marcel Coene, Geldrop, NL;
Hugo Augustinus Joseph Cramer, Eindhoven, NL;
Irwan Dani Setija, Utrecht, NL;
Willem Marie Julia Marcel Coene, Geldrop, NL;
Hugo Augustinus Joseph Cramer, Eindhoven, NL;
Irwan Dani Setija, Utrecht, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
Scatterometry method and apparatus are useful in a lithographic apparatus and device manufacturing. A back focal plane diffraction intensity image of a measurement projection system configured to project a radiation beam onto a target portion of a substrate is measured. A beam of radiation having a first wavelength is directed to the substrate. A diffraction image of a zeroth diffraction order and higher order diffraction from a diffraction structure in the substrate is provided. A first layer () of the diffractionstructure provides a diffraction image having only a zeroth diffraction order. A second layer () has a periodic structure () configured such that a lowest spatial frequency of the periodic structure is lower than spatial frequencies of interest of the first structure. From the diffraction image originating from diffraction of the radiation beam in both the first and second layer a critical dimension metrology parameter is determined.