The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 2013
Filed:
Aug. 20, 2010
Nakgeuon Seong, San Diego, CA (US);
Ivan B. Lalovic, San Francisco, CA (US);
Nigel R. Farrar, Poway, CA (US);
Robert J. Rafac, Encinitas, CA (US);
Joseph J. Bendik, Escondido, CA (US);
Nakgeuon Seong, San Diego, CA (US);
Ivan B. Lalovic, San Francisco, CA (US);
Nigel R. Farrar, Poway, CA (US);
Robert J. Rafac, Encinitas, CA (US);
Joseph J. Bendik, Escondido, CA (US);
Cymer, LLC, San Diego, CA (US);
Abstract
A method of controlling a spectral property of a light beam includes directing a light beam to a lithography exposure apparatus configured to create a pattern on a wafer; receiving information representative of a spectral property of the light beam; receiving information representative of an optical imaging condition of the lithography exposure apparatus; estimating a characteristic value of the light beam based on the received spectral property information and the received optical imaging condition information; determining whether the estimated light beam characteristic value matches a target light beam characteristic value; and if it is determined that the estimated light beam characteristic value does not match the target light beam characteristic value, adjusting the spectral property of the light beam.