The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 27, 2013

Filed:

Nov. 21, 2011
Applicants:

Roberto Schiwon, Hopewell Junction, NY (US);

Klaus Herold, Fishkill, NY (US);

Jenny Lian, Walkill, NY (US);

Sajan Marokkey, Wappingers Falls, NY (US);

Martin Ostermayr, Beacon, NY (US);

Inventors:

Roberto Schiwon, Hopewell Junction, NY (US);

Klaus Herold, Fishkill, NY (US);

Jenny Lian, Walkill, NY (US);

Sajan Marokkey, Wappingers Falls, NY (US);

Martin Ostermayr, Beacon, NY (US);

Assignee:

Infineon Technologies AG, Neubiberg, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/4763 (2006.01);
U.S. Cl.
CPC ...
Abstract

Mask sets, layout design, and methods for forming contacts in devices are described. In one embodiment, a semiconductor device includes a plurality of contacts disposed over a substrate, the plurality of contacts being disposed as rows and columns on an orthogonal grid, each row of the plurality of contacts is spaced from an neighboring row of the plurality of contacts by a first distance, and each column of the plurality of contacts is spaced from an neighboring column of the plurality of contacts by a second distance.


Find Patent Forward Citations

Loading…