The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 2013
Filed:
Aug. 22, 2011
Xiaojun Wang, Cary, NC (US);
Xiaojun Wang, Cary, NC (US);
Cadence Design Systems, Inc., San Jose, CA (US);
Abstract
A method for automatically decomposing a shape of an IC design layout into two or more shapes in order to resolve a double patterning loop violation involving the shape. The method decomposes the shape by introducing one or more splicing graphs on the shape. These splicing graphs serve as cuts to be made on the shape. By decomposing the shape into several shapes and assigning the shapes to alternating masks for the same layer, the method breaks the double patterning loop. That is, no pair of the shape and other shapes that form the loop will be assigned to the same color for a mask after the shape is decomposed. In some embodiments, the method introduces splicing points to more than one shape of the loop-forming shapes when necessary. Some embodiments minimize the number of splicing points introduced to the shape(s).
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile