The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 2013
Filed:
Dec. 22, 2008
Applicants:
Peter Gerhardus Wilhelmus Bussink, 's-Gravenhage, NL;
Anastasius Jacobus Anicetus Bruinsma, Delft, NL;
Hendricus Johannes Maria Meijer, Veldhoven, NL;
Inventors:
Peter Gerhardus Wilhelmus Bussink, 's-Gravenhage, NL;
Anastasius Jacobus Anicetus Bruinsma, Delft, NL;
Hendricus Johannes Maria Meijer, Veldhoven, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); G03B 27/54 (2006.01);
U.S. Cl.
CPC ...
Abstract
A lithographic apparatus configured to project a patterned radiation beam onto a substrate. The apparatus includes a support configured to hold a patterned object, and a measurement system configured to detect orientations and/or densities of user area structures that are present on a user area of the patterned object.