The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 2013
Filed:
May. 18, 2012
Sung Kyu Min, Seoul, KR;
Ja Chun Ku, Gyeonggi-do, KR;
Sang Tae Ahn, Gyeonggi-do, KR;
Chai O Chung, Gyeonggi-do, KR;
Hyeon Ju an, Gyeonggi-do, KR;
Hyo Seok Lee, Gyeonggi-do, KR;
Eun Jeong Kim, Gyeonggi-do, KR;
Chan Bae Kim, Seoul, KR;
Sung Kyu Min, Seoul, KR;
Ja Chun Ku, Gyeonggi-do, KR;
Sang Tae Ahn, Gyeonggi-do, KR;
Chai O Chung, Gyeonggi-do, KR;
Hyeon Ju An, Gyeonggi-do, KR;
Hyo Seok Lee, Gyeonggi-do, KR;
Eun Jeong Kim, Gyeonggi-do, KR;
Chan Bae Kim, Seoul, KR;
Hynix Semiconductor Inc., Kyoungki-do, KR;
Abstract
A reactive cyclodextrin derivative or a reactive glucose derivative is used as a template derivative for forming an ultra-low dielectric layer. A layer is formed of the reactive cyclodextrin derivative or the reactive glucose derivative capped with Si—H and then cured in an atmosphere of hydrogen peroxide to form the ultra-low dielectric layer.